optical lithography

optical lithography
 Optical Lithography
 Оптическая литография
  Технология, использующая линзы и свет для точного проецирования и экспонирования изображения маски на покрытую фоторезистом полупроводниковую пластину.

Толковый англо-русский словарь по нанотехнологии. - М.. . 2009.

Смотреть что такое "optical lithography" в других словарях:

  • Optical proximity correction — Abbildungsfehler ohne OPC und Verbesserung mit OPC Strukturen in der Fotomaske (Schema) Optical proximity correction (OPC, englisch, deutsch etwa: optische Nahbereichskorrektur) ist in der Halbleitertechnik ein Verfahren zur Korrektur bzw.… …   Deutsch Wikipedia

  • Optical mapping — Optical mapping[1] is a technique for constructing ordered, genome wide, high resolution restriction maps from single, stained molecules of DNA, called optical maps . By mapping the location of restriction enzyme sites along the unknown DNA of an …   Wikipedia

  • Optical proximity correction — An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to …   Wikipedia

  • optical stepper lithography — žingsninė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. optical stepper lithography vok. Fotolithografie nach dem Step und Repeat Verfahren, f rus. фотолитография с последовательным шаговым экспонированием, f pranc.… …   Radioelektronikos terminų žodynas

  • optical projection lithography — projekcinė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. optical projection lithography; projection photolithography vok. Lichtprojektionslithografie, f; Projektionsphotolithographie, f rus. проекционная фотолитография, f… …   Radioelektronikos terminų žodynas

  • Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

  • Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

  • Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

  • Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …   Wikipedia

  • X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… …   Wikipedia