Толковый англо-русский словарь по нанотехнологии. - М.. В.В.Арсланов. 2009.
ion-beam etching — jonpluoštis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. ion beam etching; ion beam milling vok. Ionenstrahlätzen, n rus. ионно лучевое травление, n; ионно пучковое травление, n pranc. décapage par faisceau ionique, m … Radioelektronikos terminų žodynas
reactive ion-beam etching — reaktyvusis jonpluoštis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion beam etching vok. reaktives Ionenstrahlätzen, n rus. реактивное ионно пучковое травление, n pranc. décapage par faisceau d ions réactifs, m … Radioelektronikos terminų žodynas
Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… … Wikipedia
ion-beam milling — jonpluoštis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. ion beam etching; ion beam milling vok. Ionenstrahlätzen, n rus. ионно лучевое травление, n; ионно пучковое травление, n pranc. décapage par faisceau ionique, m … Radioelektronikos terminų žodynas
Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… … Wikipedia
Gas cluster ion beam — Gas Cluster Ion Beams (GCIB) is a new technology for nano scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage. It is also used to chemically alter… … Wikipedia
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Electron beam induced deposition — (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non volatile fragments onto a nearby substrate. Process Focused electron beam of scanning electron microscope (SEM) or scanning transmission electron… … Wikipedia
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia
ионно-лучевое травление — Ion Beam Etching Ионно лучевое травление (ИЛТ) Процесс удаления вещества с поверхности твердого тела, осуществляемый его бомбардировкой пучками ионов инертных газов. Реактивное ИЛТ (РИЛТ) удаление материала за счет химического взаимодействия… … Толковый англо-русский словарь по нанотехнологии. - М.
